SU-8 photoresist

TITLE: SU-8 Photoresist Patterning on a 3” Glass Wafer (Ti coated) to fabricate microstructure test pattern. ABSTRACT: INTRODUCTION: MATERIALS AND METHODS: Materials Required: Equipment and tools: Spin Coater, Hotplates, Cleanroom Wipes, UV Light Source (Karl Suss Mask Aligner), Mask, Tweezers, and Glass Petri Dish. Chemicals: SU-8 Photoresist, SU-8 Developer (1-Methoxy-2-propanol acetate) and Isopropanol (IPA). Controls: The development procedures should be conducted in