14 A high-reflectance stack of alternating high-low index lay- ers is produced to operate at 2 um in the near infrared. A stack of four double layers is made of layers of germanium (n = 4.0) and MgF₂ (n = 1.35), each of 0.5-um optical thickness. Assume a substrate index of 1.50 and normal in- cidence. What reflectance is produced at 2 μm?

14 A high-reflectance stack of alternating high-low index lay- ers is produced to operate at 2 um in the near infrared. A stack of four double layers is made of layers of germanium (n = 4.0) and MgF₂ (n = 1.35), each of 0.5-um optical thickness. Assume a substrate index of 1.50 and normal in- cidence. What reflectance is produced at 2 μm?

Introductory Circuit Analysis (13th Edition)

13th Edition

ISBN:9780133923605

Author:Robert L. Boylestad

Publisher:Robert L. Boylestad

Chapter1: Introduction

Section: Chapter Questions

Problem 1P: Visit your local library (at school or home) and describe the extent to which it provides literature...

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