2. Variations in the Interference Pattern The graph of intensity versus below corresponds to a double-slit experiment similar to the one described in problem 1. ΑΛΛΑ 0 0 In each part below, suppose that a single change were made to the original apparatus. Use the diagram below to show how the graph of intensity versus would be different from the original graph (shown dashed). In each case, explain your reasoning. 0 a. the distance between the centers of the slits is increased (without changing the width of the slits) b. the wavelength of the incident light is increased c. the distance from the mask to the screen is decreased d. the width of both slits is decreased (without changing the distance between the centers of the slits)

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2. Variations in the Interference Pattern
The graph of intensity versus below corresponds to a double-slit experiment similar to the one described in problem 1.
ww
0
In each part below, suppose that a single change were made to the original apparatus. Use the diagram below to show how the graph of intensity versus would be different from the
original graph (shown dashed). In each case, explain your reasoning.
w
0
0
a. the distance between the centers of the slits is increased (without changing the width of the slits)
b. the wavelength of the incident light is increased
c. the distance from the mask to the screen is decreased
d. the width of both slits is decreased (without changing the distance between the centers of the slits)
Transcribed Image Text:2. Variations in the Interference Pattern The graph of intensity versus below corresponds to a double-slit experiment similar to the one described in problem 1. ww 0 In each part below, suppose that a single change were made to the original apparatus. Use the diagram below to show how the graph of intensity versus would be different from the original graph (shown dashed). In each case, explain your reasoning. w 0 0 a. the distance between the centers of the slits is increased (without changing the width of the slits) b. the wavelength of the incident light is increased c. the distance from the mask to the screen is decreased d. the width of both slits is decreased (without changing the distance between the centers of the slits)
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