A hard-bake process is used in conjunction with photolithography in semiconductor manufacturing. A random sample of size 25 is taken, and from the measurement of flow widths the sample mean and standard deviation are computed as 1.506 microns and 0.14 microns, respectively. The specification limits on flow width are 1.50 ± 0.50 microns and normally distributed. a) Find the proportions that are out of specifications.

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A hard-bake process is used in conjunction with photolithography in semiconductor manufacturing. A random sample of size 25 is taken, and from the measurement of flow widths the sample mean and standard deviation are computed as 1.506 microns and 0.14 microns, respectively. The specification limits on flow width are 1.50 ± 0.50 microns and normally distributed.

a) Find the proportions that are out of specifications. 

b) Find Natural Tolerance Limits and compare them with specifications

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