Note that ɛox = 3.97ɛo and eşi = 11.7ɛo, kT/q= 0.02588V (room temperature), and ni= 1.45x101°cm 3. %3D Problem 1-Consider a MOS system with the following Parameters: Thickness of oxide = 100nm, %3D flatband voltage (FGc) =-1.0V, substrate acceptor doping = 1x1016cm³. Determine the %3D threshold voltage Vmo under zero hias at room to mperature

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Note that ɛox = 3.97ɛo and esi = 11.7ɛo, kT/q= 0.02588V (room temperature), and n=
1.45x101°cm 3.
wwww
Problem 1-Consider a MOS system with the following Parameters: Thickness of oxide =
100nm,
flatband voltage (Fcc) =-1.0V, substrate acceptor doping = 1x1016cm-3. Determine the
threshold voltage VTo under zero bias at room temperature.
Transcribed Image Text:Note that ɛox = 3.97ɛo and esi = 11.7ɛo, kT/q= 0.02588V (room temperature), and n= 1.45x101°cm 3. wwww Problem 1-Consider a MOS system with the following Parameters: Thickness of oxide = 100nm, flatband voltage (Fcc) =-1.0V, substrate acceptor doping = 1x1016cm-3. Determine the threshold voltage VTo under zero bias at room temperature.
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