The photoresist thickness of wafers in semiconductor manufacturing has a mean of 10.6 micrometers and a standard deviation of 1.3 An engineer takes a sample of 50 wafers once a week and calculates the mean thickness of these wafers. If the mean of this sample is either less than 10.41 micrometers or greater than 10.79 micrometers, the engineer will conclude that the machine needs an adjustment. The probability that, based on a sample of 50 wafers, the engineer will conclude that the machine needs an adjustment is: O 0.6970 O 0.1091 O 0.3030 O 0.2522 O 0.1506

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The photoresist thickness of wafers in semiconductor manufacturing has a mean of 10.6 micrometers and a standard deviation of 1.3 micrometers.
An engineer takes a sample of 50 wafers once a week and calculates the mean thickness of these wafers. If the mean of this sample is either less than 10.41
micrometers or greater than 10.79 micrometers, the engineer will conclude that the machine needs an adjustment.
The probability that, based on a sample of 50 wafers, the engineer will conclude that the machine needs an adjustment is:
O 0.6970
O 0.1091
O 0.3030
O 0.2522
O 0.1506
Transcribed Image Text:The photoresist thickness of wafers in semiconductor manufacturing has a mean of 10.6 micrometers and a standard deviation of 1.3 micrometers. An engineer takes a sample of 50 wafers once a week and calculates the mean thickness of these wafers. If the mean of this sample is either less than 10.41 micrometers or greater than 10.79 micrometers, the engineer will conclude that the machine needs an adjustment. The probability that, based on a sample of 50 wafers, the engineer will conclude that the machine needs an adjustment is: O 0.6970 O 0.1091 O 0.3030 O 0.2522 O 0.1506
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