Consider the meander-line resistor shown (top view) at right. The device is to be fabricated using an evaporated film of nichrome with p=100μ cm. Find: W a. The required film thickness in order to achieve a sheet resistance of r = 50/. a. The total resistance of the structure, b. The minimum line width w that will keep the current density below a critical value of 105 A/cm² if the maximum applied voltage is 10 V.

Consider the meander-line resistor shown (top view) at right. The device is to be fabricated using an evaporated film of nichrome with p=100μ cm. Find: W a. The required film thickness in order to achieve a sheet resistance of r = 50/. a. The total resistance of the structure, b. The minimum line width w that will keep the current density below a critical value of 105 A/cm² if the maximum applied voltage is 10 V.

Power System Analysis and Design (MindTap Course List)

6th Edition

ISBN:9781305632134

Author:J. Duncan Glover, Thomas Overbye, Mulukutla S. Sarma

Publisher:J. Duncan Glover, Thomas Overbye, Mulukutla S. Sarma

Chapter4: Transmission Line Parameters

Section: Chapter Questions

Problem 4.4P: One thousand circular mils or 1 kcmil is sometimes designated by the abbreviation MCM75C. Data for...

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