In photolithography, the mask is essential. Without the mask, photolithography can be finished. positive photoresist will stay on the substrate after UV exposure and subsequent development negative photoresist will be dissolved after UV exposure and subsequent development A 1000-level cleanroom is much better than a 10-level one chrome mask is better than a film mask

In photolithography, the mask is essential. Without the mask, photolithography can be finished. positive photoresist will stay on the substrate after UV exposure and subsequent development negative photoresist will be dissolved after UV exposure and subsequent development A 1000-level cleanroom is much better than a 10-level one chrome mask is better than a film mask

Refrigeration and Air Conditioning Technology (MindTap Course List)

8th Edition

ISBN:9781305578296

Author:John Tomczyk, Eugene Silberstein, Bill Whitman, Bill Johnson

Publisher:John Tomczyk, Eugene Silberstein, Bill Whitman, Bill Johnson

Chapter26: Applications Of Refrigeration Systems

Section: Chapter Questions

Problem 1RQ: The two broad categories of display cases are _______and _______.

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