2. In lithography process, you are asked to deposit nanoparticle in hc Resist A metal Substrate After development N of resist dep (a) Striping resist Deposition of nanomaterial-Etching (b) Etching -→ Deposition of nanomaterial Striping resist (c) Deposition of nanomaterial - Striping resist Etching

Understanding Motor Controls
4th Edition
ISBN:9781337798686
Author:Stephen L. Herman
Publisher:Stephen L. Herman
Chapter44: Semiconductors
Section: Chapter Questions
Problem 3RQ: The two materials most often used to produce semiconductor devices are ____________ and...
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2. In lithography process, you are asked to deposit nanoparticle in holes. Select the process steps in order.
Resist
A metal
elching
Substrate
After development
SHiping
Nanomaterial
of resist
deposited in holes
wetChem cal)
(a) Striping resist Deposition of nanomaterial -Etching
(b) Etching - Deposition of nanomaterial Striping resist
(c) Deposition of nanomaterial- Striping resist Etching
Cmone
Transcribed Image Text:2. In lithography process, you are asked to deposit nanoparticle in holes. Select the process steps in order. Resist A metal elching Substrate After development SHiping Nanomaterial of resist deposited in holes wetChem cal) (a) Striping resist Deposition of nanomaterial -Etching (b) Etching - Deposition of nanomaterial Striping resist (c) Deposition of nanomaterial- Striping resist Etching Cmone
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