a) An n-type extrinsic semiconductor is formed by the deliberate addition of a small number of phosphorus (P) donor impurities to an intrinsic silicon (Si) semiconductor sample. Explain why at room temperature this gives rise to a large increase in the concentration of electrons in the conduction band. Your answer should include a sketch of the energy level diagram for the semiconductor as well as a sketch of the atomic bonding arrangement. b) A concentration N of donor impurities is added to an intrinsic semiconductor, hence forming an n-type semiconductor. Assuming that the donor impurities are completely ionised, use the law of mass action and the concept of charge neutrality to show that the concentration n of electrons in the conduction band is given by: ne N₁ + (№² +4n²) 2 where n, is the charge carrier concentration in the intrinsic semiconductor.

Power System Analysis and Design (MindTap Course List)
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Author:J. Duncan Glover, Thomas Overbye, Mulukutla S. Sarma
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Chapter4: Transmission Line Parameters
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4.
a) An n-type extrinsic semiconductor is formed by the deliberate addition of a small
number of phosphorus (P) donor impurities to an intrinsic silicon (Si) semiconductor
sample. Explain why at room temperature this gives rise to a large increase in the
concentration of electrons in the conduction band. Your answer should include a
sketch of the energy level diagram for the semiconductor as well as a sketch of the
atomic bonding arrangement.
b) A concentration N, of donor impurities is added to an intrinsic semiconductor, hence
forming an n-type semiconductor. Assuming that the donor impurities are completely
ionised, use the law of mass action and the concept of charge neutrality to show that
the concentration of electrons in the conduction band is given by:
ne
N₂ + (№² +4n²) ³
2
where n is the charge carrier concentration in the intrinsic semiconductor.
Transcribed Image Text:4. a) An n-type extrinsic semiconductor is formed by the deliberate addition of a small number of phosphorus (P) donor impurities to an intrinsic silicon (Si) semiconductor sample. Explain why at room temperature this gives rise to a large increase in the concentration of electrons in the conduction band. Your answer should include a sketch of the energy level diagram for the semiconductor as well as a sketch of the atomic bonding arrangement. b) A concentration N, of donor impurities is added to an intrinsic semiconductor, hence forming an n-type semiconductor. Assuming that the donor impurities are completely ionised, use the law of mass action and the concept of charge neutrality to show that the concentration of electrons in the conduction band is given by: ne N₂ + (№² +4n²) ³ 2 where n is the charge carrier concentration in the intrinsic semiconductor.
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