In an integrated circuit, a capacitor is formed by growing silicon dioxide layer of thickness 1 [um] with E,=4 over the conducting silicon substrate and covering it with a metal electrode with area S. Determine the size of the capacitor if a capacitance of 2 [nF] is needed. -Use numbers when answering, rouding to the hundredths in the format 0.00 -Input your answers in units of [cm²]

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Chapter25: Electric Potential
Section: Chapter Questions
Problem 25.1OQ: In a certain region of space, the electric field is zero. From this fact, what can you conclude...
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In an integrated circuit, a capacitor is formed by growing silicon dioxide layer of thickness 1 [um] with E,-4 over the conducting silicon substrate and covering it with a metal
electrode with area S. Determine the size of the capacitor if a capacitance of 2 [nF] is needed.
-Use numbers when answering, rouding to the hundredths in the format 0.00
-Input your answers in units of [cm²]
X 5.65
Transcribed Image Text:In an integrated circuit, a capacitor is formed by growing silicon dioxide layer of thickness 1 [um] with E,-4 over the conducting silicon substrate and covering it with a metal electrode with area S. Determine the size of the capacitor if a capacitance of 2 [nF] is needed. -Use numbers when answering, rouding to the hundredths in the format 0.00 -Input your answers in units of [cm²] X 5.65
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