In making computer chips, a 4.00-kg cylindrical ingot of ultrapure n-type doped silicon that is 5.20 inches in diameter is sliced into wafers 1.12x10-4 m thick. (a) Assuming no waste, how many wafers can be made? (b) What is the mass of a wafer (d of Si = 2.34 g/cm3; V of a cylinder = πr2h)? (c) A key step in making π-n junctions for the chip is chemical removal of the oxide layer on the wafer through treatment with gaseous HF. Write a balanced equation for this reaction. (d) If 0.750% of the Si atoms are removed during the treatment in part (c), how many moles of HF are required per wafer, assuming 100% reaction yield?

General Chemistry - Standalone book (MindTap Course List)
11th Edition
ISBN:9781305580343
Author:Steven D. Gammon, Ebbing, Darrell Ebbing, Steven D., Darrell; Gammon, Darrell Ebbing; Steven D. Gammon, Darrell D.; Gammon, Ebbing; Steven D. Gammon; Darrell
Publisher:Steven D. Gammon, Ebbing, Darrell Ebbing, Steven D., Darrell; Gammon, Darrell Ebbing; Steven D. Gammon, Darrell D.; Gammon, Ebbing; Steven D. Gammon; Darrell
Chapter6: Thermochemisty
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Problem 6.94QP
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In making computer chips, a 4.00-kg cylindrical ingot of ultrapure n-type doped silicon that is 5.20 inches in diameter is sliced into wafers 1.12x10-4 m thick. (a) Assuming no waste, how many wafers can be made? (b) What is the mass of a wafer (d of Si = 2.34 g/cm3; V of a cylinder = πr2h)? (c) A key step in making π-n junctions for the chip is chemical removal of the oxide layer on the wafer through treatment with gaseous HF. Write a balanced equation for this reaction. (d) If 0.750% of the Si atoms are removed during the treatment in part (c), how many moles of HF are required per wafer, assuming 100% reaction yield?

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