The thickness of photoresist applied to wafers in semiconductor manufacturing at a particular location on the wafer is uniformly distributed between 0.2047 and 0.2153 micrometers. (a) Determine the proportion of wafers that exceeds 0.2125 micrometers of photoresist thickness. (Round your answer to 3 decimal places.) (b) Determine the mean of X (Round your answer to 4 decimal places.) micrometers (c) Determine the variance of X (Round your answer to 8 decimal places) i micrometers2
The thickness of photoresist applied to wafers in semiconductor manufacturing at a particular location on the wafer is uniformly distributed between 0.2047 and 0.2153 micrometers. (a) Determine the proportion of wafers that exceeds 0.2125 micrometers of photoresist thickness. (Round your answer to 3 decimal places.) (b) Determine the mean of X (Round your answer to 4 decimal places.) micrometers (c) Determine the variance of X (Round your answer to 8 decimal places) i micrometers2
Mathematics For Machine Technology
8th Edition
ISBN:9781337798310
Author:Peterson, John.
Publisher:Peterson, John.
Chapter38: Achievement Review—section Three
Section: Chapter Questions
Problem 6AR
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