Calculate the junction depth and the total amount of dopant introduced after pre deposition process performed at 975° C using diborane gas for 60 minutes in a neutral ambient. Assume the substrate is n- type silicon with Np 7.2 x 1016 cm3 and the boron surface concentration is Cs 6 x 1019 cm3
Calculate the junction depth and the total amount of dopant introduced after pre deposition process performed at 975° C using diborane gas for 60 minutes in a neutral ambient. Assume the substrate is n- type silicon with Np 7.2 x 1016 cm3 and the boron surface concentration is Cs 6 x 1019 cm3
Delmar's Standard Textbook Of Electricity
7th Edition
ISBN:9781337900348
Author:Stephen L. Herman
Publisher:Stephen L. Herman
Chapter1: Atomic Structure
Section: Chapter Questions
Problem 6RQ: How many valence electrons are generally contained in materials used for insulators?
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