Christopher uses monochromatic light and shines it on a material with index of refraction 1.5, surrounded by water on one side and air on the other side. If the light has wavelength 534 nm within the film, what is the film thickness in nanometers for which maximum constructive interference between the incident beam and the reflected beam occurs? Please give your answer as a whole number.

University Physics Volume 3
17th Edition
ISBN:9781938168185
Author:William Moebs, Jeff Sanny
Publisher:William Moebs, Jeff Sanny
Chapter4: Diffraction
Section: Chapter Questions
Problem 39P: When a monochromatic light of wavelength 430 nm incident on a double slit of slit separation 5 m,...
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Christopher uses monochromatic light and shines it on a material with index of refraction 1.5,
surrounded by water on one side and air on the other side. If the light has wavelength 534 nm
within the film, what is the film thickness in nanometers for which maximum constructive
interference between the incident beam and the reflected beam occurs? Please give your answer
as a whole number.
Transcribed Image Text:Christopher uses monochromatic light and shines it on a material with index of refraction 1.5, surrounded by water on one side and air on the other side. If the light has wavelength 534 nm within the film, what is the film thickness in nanometers for which maximum constructive interference between the incident beam and the reflected beam occurs? Please give your answer as a whole number.
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