D4802.12.fid spektroskopi15@kiku.dk u28 C13APT64 CDC13 /opt/topspin/data bnmr1 22 134.2 134.0 133.8 133.6 133.4 133.2 133.0 132.8 132.6 132.4 132.2 f1 (ppm) 132.0 131.8 131.6 131.4 131.2 131.0 130.8 130.6 130.4 130.2 -7000 -6000 -5000 --4000 -3000 -2000 -1000 To -1000 ---2000 130.0
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Analyse the 13C NMR spectrum for 1,3-dibromobenzene
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- https://m.youtube.com/watch?v=vM1SP346XBc&list=PLeJOSNLNZfHubfLdq0kOayASeUllMOGn4&index=4 I watched this the lecture video over and over and I am allowed to work with someone but I am having trouble with part B and I provided the YouTube link of the data or video attached to this labShow all steps leading to the final answer po. Here’s a pdf file in accordance with the topic po: https://drive.google.com/file/d/1_FnDtXCrFKSol3RNWIG_9tNQ7IxgxD6t/view?usp=drivesdkModule Code & Title: CHM9011M Chromatography and Sep Sciences Section 1: Purpose Clarity of Purpose ): Clearly states the purpose of the SOP. Relevance to Task : Demonstrates the importance and relevance of the procedure. Alignment with Goals ): Shows how the procedure aligns with organisational goals.
- Sample IdentificationCodeConcentration of M%TA=2-log(%T)Q50004.00 x 10-417.90.75Q50013.20 x 10-425.00.6Q50022.40 x 10-435.70.46Q50031.60 x 10-450.20.3Q50048.000 x 10-570.80.15SampleIdentificationCode%TA=2-log(%T)AMQ0210150143.70.359518560.360.000192Q0210150244.10.355561410.360.00018Q0210150343.80.358525890.360.00017Q0210150444.10.355561410.360.00018Q0210150543.80.358525890.360.00017What was their percent error?43%Does Batch 021015 meet legal requirements?No, because it is not between 2.85 * 10(4) and 3.15 * 10(4)Well #DropsBluedye1234567891012345678910Drops 9Distilled water876543210Concne 0.26tration0.52Test Tube #0.781.041.3Solutions3Concentration (M)2.082.32.6Concentration (ppm)1:1 dilution11.82Starting Dilution21.562:1 dilution0A.Zero standard0Was your calibration curve as linear as you expected?B.Did you experience any âdriftâ of the resistance readings?C.What is the equation of your best-fit line?D.What commercial drink did you analyze?E.Assuming…Hiii!! does anyone here can help me with this said activity? How can i know what the vid is telling ( https://youtu.be/dinNjEiqxcg , https://youtu.be/Xj0X3CS9J3k , and https://youtu.be/1IaaMeGQwdg ). thank uThe thermal conductivities of human tissues vary greatly. Fat and skin have conductivities of about 0.20 W/m · K and 0.020 W/m · K respectively, while other tissues inside the body have conductivities of about 0.50 W/m · K. Assume that between the core region of the body and the skin surface lies a skin layer of 1.0 mm, fat layer of 0.50 cm, and 3.2 cm of other tissues. (a) Find the R-factor for each of these layers, and the equivalent R-factor for all layers taken together, retaining two digits. Rskin m2 · K/W Rfat m2 · K/W Rtissue m2 · K/W R m2 · K/W (b) Find the rate of energy loss when the core temperature is 37°C and the exterior temperature is 0°C. Assume that both a protective layer of clothing and an insulating layer of unmoving air are absent, and a body area of 2.0 m2. W
- An article in Solid State Technology, "Orthogonal Design of Process Optimization and Its Application to Plasma Etching" by G.Z. Yin and D.W. Jillie (May, 1987) describes an experiment to determine the effect of C2F6 flow rate on the uniformity of the etch on a silicon wafer used in integrated circuit manufacturing. Data for two flow rates are as follows: C2F6 Uniformity Observation (SCCM) 1 2 3 4 5 6 125 2.7 4.6 2.6 3.0 3.2 3.8 200 4.6 3.4 2.9 3.5 4.1 5.1 (a) Does the C2F6 flow rate affect the wafer-to-wafer variability in etch uniformity? Use = 0.05. (b) Draw box plots to assist in the interpretation of the data from this experimentAn article in Solid State Technology, "Orthogonal Design of Process Optimization and Its Application to Plasma Etching" by G.Z. Yin and D.W. Jillie (May, 1987) describes an experiment to determine the effect of C2F6 flow rate on the uniformity of the etch on a silicon wafer used in integrated circuit manufacturing. Data for two flow rates are as follows: C2F6 Uniformity Observation (SCCM) 1 2 3 4 5 6 125 2.7 4.6 2.6 3.0 3.2 3.8 200 4.6 3.4 2.9 3.5 4.1 5.1 C2F6 Uniformity Observation (SCCM) 1 2 3 4 5 6 125 2.7 4.6 2.6 3.0 3.2 3.8 200 4.6 3.4 2.9 3.5 4.1 5.1 (a) Does the C2F6 flow rate affect average etch uniformity? Use = 0.05. (b) What is the P-value for the test in part (a)?Qq.1. Subject :- Account