The thickness of photoresist applied to wafers in semiconductor manufacturing at a particular location on the wafer is uniformly distributed between 0.2037 and 0.2142 micrometers. (a) Determine the proportion of wafers that exceeds 0.2125 micrometers of photoresist thickness. (Round your answer to 3 decir places.) (b) Determine the mean of X. (Round your answer to 4 decimal places.) micrometers (c) Determine the variance of X. (Round your answer to 8 decimal places.) i micrometers²

The thickness of photoresist applied to wafers in semiconductor manufacturing at a particular location on the wafer is uniformly distributed between 0.2037 and 0.2142 micrometers. (a) Determine the proportion of wafers that exceeds 0.2125 micrometers of photoresist thickness. (Round your answer to 3 decir places.) (b) Determine the mean of X. (Round your answer to 4 decimal places.) micrometers (c) Determine the variance of X. (Round your answer to 8 decimal places.) i micrometers²

College Algebra

10th Edition

ISBN:9781337282291

Author:Ron Larson

Publisher:Ron Larson

Chapter5: Exponential And Logarithmic Functions

Section5.5: Exponential And Logarithmic Models

Problem 4ECP

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