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Lab Report : ' Glass Wafer '

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TITLE:
SU-8 Photoresist Patterning on a 3” Glass Wafer (Ti coated) to fabricate microstructure test pattern.

ABSTRACT:

INTRODUCTION:

MATERIALS AND METHODS:

Materials Required:

Equipment and tools:

Spin Coater, Hotplates, Cleanroom Wipes, UV Light Source (Karl Suss Mask Aligner), Mask, Tweezers, and Glass Petri Dish.

Chemicals:

SU-8 Photoresist, SU-8 Developer (1-Methoxy-2-propanol acetate) and Isopropanol (IPA).

Controls:

The development procedures should be conducted in the wet bench hood and the chemicals used should be disposed of as advised.

Personal Protective Equipment:

Cleanroom suit, nitrile gloves and safety eye protection required for all procedures.

Substrate Pre- Treatment (Cleaning) SU-8 …show more content…

Consequently, areas of the SU-8 film can polymerize at different rates. This short tutorial aims at providing some insights on the equipment and protocols that must be followed in order to coat SU-8 uniformly throughout the wafer surface.

The spin coating process is carried out with a spin coater (see Figure 2a). Figure 2b illustrates the principle of spin coating process. The substrate to be coated is positioned on a chuck which can be rotated at high speed (e.g., 2000-8000 rpm). A vacuum line is used in order to firmly maintain the wafer in place. SU-8 is gently deposited on the center of the wafer in order to cover around 2/3 of the wafer surface. When the wafer is accelerated, centrifugal forces will cause the photoresist to spread up to the edge of the wafer; leaving a thin film on its surface.

Soft Baking / Pre- Baking
The third step involved was Pre-Baking. Since the SU-8 film was still in liquid form after the spin coating, so it had to be cured before exposing. Pre-Baking evaporated the solvent and made the SU-8 film denser. It had to be done on a hot plate. Pre-Baking involved two stages where two hot plates were used.

The first hot plate was set at a temperature of 65°C and the second one was set at 95°C. Consulting the datasheet provided by the manufacturer, the film was placed on the first hot plate for 120

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