1. Hydrofluoric acid, an aqueous solution containing dissolved hydrogen fluoride, is used to etch glass by reacting with the silica, Si O2, in the glass to produce gaseous silicon tetrafluoride and liquid water. The unbalanced equation is HF + SiO2  SiF4 + H2O a. Calculate the mass of hydrogen fluoride needed to react with 5.68 g of silica. b. Calculate the mass of water produced in the reaction described in part A

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Problem 34QAP: Small quantities of oxygen gas can be generated in the laboratory by the decomposition of hydrogen...
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1. Hydrofluoric acid, an aqueous solution containing dissolved hydrogen fluoride, is used
to etch glass by reacting with the silica, Si O2, in the glass to produce gaseous silicon
tetrafluoride and liquid water. The unbalanced equation is
HF + SiO2  SiF4 + H2O

a. Calculate the mass of hydrogen fluoride needed to react with 5.68 g of silica.
b. Calculate the mass of water produced in the reaction described in part A.

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