The photoresist thickness is one the quality characteristic in integrate circuits. A new process has been developed for applying photoresist to 125-mm silicon wafers used in manufacturing integrated circuits. Twelve wafers were tested, and the following photoresist thickness measurements were observed: 13.3987, 13.3957, 13.3902, 13.4015, 13.4001, 13.3918, 13.3965, 13.3925, 13.3946, 13.3939, 13.4005 and 13.4002. Assume that thickness is normally distributed. a) Test the hypothesis that mean thickness is 13.4x1000 Å. Use a=0.05 and assume a two-sided alternative.  b) Find a 99% two-sided confidence interval on mean photoresist thickness.

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The photoresist thickness is one the quality characteristic in integrate circuits. A new process has been developed for applying photoresist to 125-mm silicon wafers used in manufacturing integrated circuits. Twelve wafers were tested, and the following photoresist thickness measurements were observed: 13.3987, 13.3957, 13.3902, 13.4015, 13.4001, 13.3918, 13.3965, 13.3925, 13.3946, 13.3939, 13.4005 and 13.4002. Assume that thickness is normally distributed.

a) Test the hypothesis that mean thickness is 13.4x1000 Å. Use a=0.05 and assume a two-sided alternative. 

b) Find a 99% two-sided confidence interval on mean photoresist thickness.

c) Find a 95% two-sided confidence interval on standard deviation of photoresist thickness. 

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