Two factors in a manufacturing process for an integrated circuit are studied in a two-factor experiment. The purpose of the experiment is to learn the effect of the factors on the resistivity of wafers. The factors are implant does (2 levels) and furnace position (3 levels). It is to be assumed that NO interaction exists between these two factors. ANOVA Table Source of Variation Sum of Squares Degrees of Freedom Mean Square Computed f P-value Dose 117.9267 1 117.9267 18.ce 0.0511 Position 15.0633 2 7.5317 1.15 0.4641 Error 13.0433 2 6.5217 Toal 146.0333

Big Ideas Math A Bridge To Success Algebra 1: Student Edition 2015
1st Edition
ISBN:9781680331141
Author:HOUGHTON MIFFLIN HARCOURT
Publisher:HOUGHTON MIFFLIN HARCOURT
Chapter4: Writing Linear Equations
Section: Chapter Questions
Problem 14CR
icon
Related questions
Question
upvote is waiting
Two factors in a manufacturing process for an integrated circuit are studied in a two-factor experiment. The purpose of the experiment is to learn the effect of the factors on the
resistivity of wafers. The factors are implant does (2 levels) and furnace position (3 levels). It Is to be assumed that NO interaction exists between these two factors.
ANOVA Table
Source of Variatfon
Sum of Squares
Degrees of Freedom
Mean Square
Computed f
P-value
Dose
117.9267
117.9267
18.08
0.0511
Position
15.0633
7.5317
1.15
0.4641
Error
13.0433
6.5217
Total
146.0333
Transcribed Image Text:Two factors in a manufacturing process for an integrated circuit are studied in a two-factor experiment. The purpose of the experiment is to learn the effect of the factors on the resistivity of wafers. The factors are implant does (2 levels) and furnace position (3 levels). It Is to be assumed that NO interaction exists between these two factors. ANOVA Table Source of Variatfon Sum of Squares Degrees of Freedom Mean Square Computed f P-value Dose 117.9267 117.9267 18.08 0.0511 Position 15.0633 7.5317 1.15 0.4641 Error 13.0433 6.5217 Total 146.0333
Question 14
Ata significance level of 0.05 and applying P-value approach, which of the following conclusion is INCORRECT?
I. The mean resistivity of the wafer is afflected by the furnace position.
II. The mean resistivity of the wafer Is not affected by the implant dose.
O H enly
O l onty
O Both I and II
O Neither Inon
O incencushe
Question 15
At a significance level of 0.05. the critical f value for the position factor is
o foos. 22
o fo.02s. 2.2
O foos, 2.3
Transcribed Image Text:Question 14 Ata significance level of 0.05 and applying P-value approach, which of the following conclusion is INCORRECT? I. The mean resistivity of the wafer is afflected by the furnace position. II. The mean resistivity of the wafer Is not affected by the implant dose. O H enly O l onty O Both I and II O Neither Inon O incencushe Question 15 At a significance level of 0.05. the critical f value for the position factor is o foos. 22 o fo.02s. 2.2 O foos, 2.3
Expert Solution
trending now

Trending now

This is a popular solution!

steps

Step by step

Solved in 3 steps with 1 images

Blurred answer
Similar questions
  • SEE MORE QUESTIONS
Recommended textbooks for you
Big Ideas Math A Bridge To Success Algebra 1: Stu…
Big Ideas Math A Bridge To Success Algebra 1: Stu…
Algebra
ISBN:
9781680331141
Author:
HOUGHTON MIFFLIN HARCOURT
Publisher:
Houghton Mifflin Harcourt
Holt Mcdougal Larson Pre-algebra: Student Edition…
Holt Mcdougal Larson Pre-algebra: Student Edition…
Algebra
ISBN:
9780547587776
Author:
HOLT MCDOUGAL
Publisher:
HOLT MCDOUGAL