The Si stepped bonding maintained at room temperature in a balanced state has a p-type doping of Na = 2*10^15/cm^3 and an n-type doping of ND = 10^15/cm^3. Next calculation.1) Draw charge density, electric field, and constant potential at approximately constant ratios as a function of the location of 1) Vbi 2)Xp, Xn, W 3)X=0 to E 4)X=0 to V 5)Draw charge density, electric field, and static potential at approximately constant rates as a function of position.
The Si stepped bonding maintained at room temperature in a balanced state has a p-type doping of Na = 2*10^15/cm^3 and an n-type doping of ND = 10^15/cm^3. Next calculation.1) Draw charge density, electric field, and constant potential at approximately constant ratios as a function of the location of 1) Vbi 2)Xp, Xn, W 3)X=0 to E 4)X=0 to V 5)Draw charge density, electric field, and static potential at approximately constant rates as a function of position.
Modern Physics
3rd Edition
ISBN:9781111794378
Author:Raymond A. Serway, Clement J. Moses, Curt A. Moyer
Publisher:Raymond A. Serway, Clement J. Moses, Curt A. Moyer
Chapter12: The Solid State
Section: Chapter Questions
Problem 9P
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The Si stepped bonding maintained at room temperature in a balanced state has a p-type doping of Na = 2*10^15/cm^3 and an n-type doping of ND = 10^15/cm^3. Next calculation.1) Draw charge density, electric field, and constant potential at approximately constant ratios as a function of the location of
1) Vbi
2)Xp, Xn, W
3)X=0 to E
4)X=0 to V
5)Draw charge density, electric field, and static potential at approximately constant rates as a function of position.
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