14 1/1 point Hemoglobin molecules carry oxygen from the lungs to tissue cells where the oxygen is then released for use in metabolic processes. The molecule can be represented as Hb in its unoxygenated form and as Hb O2 in its oxygenated form. One reason why carbon monoxide is toxic is that it competes with O2 to bind to Hb: Hb O2 (aq) + CO(g) =Hb•CO(aq) + O2(g) If AG°-14kJ at 37°C (body temp), what is the ratio of [Hb•CO] to [Hb•O2] at 37°C if [02]=[CO]? 143-to-1 1-to-143 ● 229-to-1 1-to-229

14 1/1 point Hemoglobin molecules carry oxygen from the lungs to tissue cells where the oxygen is then released for use in metabolic processes. The molecule can be represented as Hb in its unoxygenated form and as Hb O2 in its oxygenated form. One reason why carbon monoxide is toxic is that it competes with O2 to bind to Hb: Hb O2 (aq) + CO(g) =Hb•CO(aq) + O2(g) If AG°-14kJ at 37°C (body temp), what is the ratio of [Hb•CO] to [Hb•O2] at 37°C if [02]=[CO]? 143-to-1 1-to-143 ● 229-to-1 1-to-229

Chemistry: Principles and Reactions

8th Edition

ISBN:9781305079373

Author:William L. Masterton, Cecile N. Hurley

Publisher:William L. Masterton, Cecile N. Hurley

Chapter21: Chemistry Of The Nonmetals

Section: Chapter Questions

Problem 73QAP: The amount of sodium hypochlorite in a bleach solution can be determined by using a given volume of...

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Three reactions very important to the semiconductor industry are The reduction of silicon dioxide to crude silicon, SiO2(s) + 2 C(s) → Si(s) + 2 CO(g) ΔrH° = 689.9 kJ/mol The formation of silicon tetrachloride from crude silicon, Si(s) + 2 Cl2(g) → SiCl4(g) ΔrH° = −657.01 kJ/mol The reduction of silicon tetrachloride to pure silicon with magnesium, SiCl4(g) + 2 Mg(s) → 2 MgCl2(s) + Si(s) ΔrH° = −625.6 kJ/mol Calculate the overall enthalpy change when 1.00 mol sand, SiO2, changes into very pure silicon by this series of reactions.
Aluminum is produced commercially by the electrolysis of Al2O3 in the presence of a molten salt. If a plant has a continuous capacity of 1.00 million A, what mass of aluminum can be produced in 2.00 h?
Comparing the chemistry of carbon and silicon. (a) Write balanced chemical equations for the reactions of H2O() with CH4 (forming CO2 and H2) and SiH4 (forming SiO2 and H2). (b) Using thermodynamic data, calculate the standard free energy change for the reactions in (a). Is either reaction product-favored at equilibrium? (c) Look up the electronegativities of carbon, silicon, and hydrogen. What conclusion can you draw concerning the polarity of CH and SiH bonds? (d) Carbon and silicon compounds with the formulas (CH3)2CO (acetone) and [(CH3)2SiO]n (a silicone polymer) also have quite different structures. Draw Lewis structures for these species. This difference, along with the difference between structures of CO2 and SiO2, suggests a general observation about silicon compounds. Based on that observation, do you expect that a silicon compound with a structure similar to ethene (C2H4) exists?
The amount of sodium hypochlorite in a bleach solution can be determined by using a given volume of bleach to oxidize excess iodide ion to iodine; ClO- is reduced to Cl-. The amount of iodine produced by the redox reaction is determined by titration with sodium thiosulfate, Na2S2O3; I2 is reduced to I-. The sodium thiosulfate is oxidized to sodium tetrathionate, Na2S4O6. In this analysis, potassium iodide was added in excess to 5.00 mL of bleach (d=1.00g/cm3) . If 25.00 mL of 0.0700 M Na2S2O3 was required to reduce all the iodine produced by the bleach back to iodide, what is the mass percent of NaClO in the bleach?
Write balanced chemical equations for the following reactions. (a) The reaction of aluminum and iron(III) oxide to form iron and aluminum oxide (known as the thermite reaction). (b) The reaction of carbon and water at high temperature to form a mixture of gaseous CO and H2 (known as water gas and once used as a fuel). (c) The reaction of liquid silicon tetrachloride and magnesium forming silicon and magnesium chloride. This is one step in the preparation of ultrapure silicon used in the semiconductor industry

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