Foundations of Materials Science and Engineering
Foundations of Materials Science and Engineering
6th Edition
ISBN: 9781259696558
Author: SMITH
Publisher: MCG
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Chapter 14.12, Problem 73AAP

A silicon wafer is doped with 2.50 × 1016 boron atoms/cm3 plus 1.60 × 1016 phosphorus atoms/cm3 at 27°C. Calculate (a) the electron and hole concentrations (carriers per cubic centimeter), (b) the electron and hole mobilities (use Fig. 14.26), and (c) the electrical resistivity of the material.

(a)

Expert Solution
Check Mark
To determine

The concentration of electrons and holes.

Answer to Problem 73AAP

The concentration of electrons is 2.50×104cm-3.

The concentration of holes is 9×1015cm3.

Explanation of Solution

Write the expression to calculate the concentration of holes.

    pp=NaNd                                                                      ...... (I)

Here, concentration of boron atoms is Na, the concentration of phosphorus is Nd and the concentration of holes is pp.

Write the expression to calculate the concentration of electrons.

    np=ni2pp                                                                          ...... (II)

Here, the intrinsic carrier concentration is ni and the concentration of electrons is np.

Conclusion:

Substitute 1.6×1016cm3 for Nd and 2.50×1016cm3 for Na in equation (I).

    pp=2.50×1016cm31.6×1016cm3=9×1015cm3

Substitute 9×1015cm3 for pp and 1.5×1010cm3 for ni in equation (II).

    np=(1.5×1010cm3)29×1015cm3=2.25×1020cm-69×1015cm3=2.50×104cm-3

Thus, the concentration of electrons is 2.50×104cm-3.

Thus, the concentration of holes is 9×1015cm3.

(b)

Expert Solution
Check Mark
To determine

The electron and hole motilities.

Answer to Problem 73AAP

The mobility of electrons is 850cm2/Vs.

The mobility of holes is 250cm2/Vs.

Explanation of Solution

Conclusion:

Refer to the Figure-14.26, “The effect of total ionized impurity concentration on the mobility of charge carriers in silicon at room temperature.” to obtain the value of total impurity concentration as CT=4.1×1016ions/cm3.

Refer to the Figure-14.26, “The effect of total ionized impurity concentration on the mobility of charge carriers in silicon at room temperature.” to obtain the value of electron mobility at CT=4.1×1016ions/cm3 as μn=850cm2/Vs and holes mobility as μp=250cm2/Vs.

Thus, the mobility of electrons is 850cm2/Vs.

Thus, the mobility of holes is 250cm2/Vs.

(c)

Expert Solution
Check Mark
To determine

The electrical resistivity of the material.

Answer to Problem 73AAP

The electrical resistivity of the material is 2.77Ωcm.

Explanation of Solution

Write the expression to calculate the resistivity for p-type semiconductor.

    ρ=1qμppp                                                                                ...... (III)

Conclusion:

Substitute 1.6×1019C for q, 250cm2/Vs for μp and 9×1015cm3 for pp in equation (III).

    ρ=1(1.6×1019C)×(250cm2/Vs)×(9×1015cm3)=1(400×1019Ccm2/Vs)(9×1015cm3)=13.6×101(Ωcm)1=2.77Ωcm

Thus, the electrical resistivity of the material is 2.77Ωcm.

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Chapter 14 Solutions

Foundations of Materials Science and Engineering

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