Physics for Scientists and Engineers with Modern Physics, Technology Update
Physics for Scientists and Engineers with Modern Physics, Technology Update
9th Edition
ISBN: 9781305401969
Author: SERWAY, Raymond A.; Jewett, John W.
Publisher: Cengage Learning
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Chapter 43, Problem 5OQ
To determine

The property of semiconductor that makes its conductivity increase with increasing temperature.

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In a bipolar junction transistor:   A) all the three regions (the emitter, the base and the collector) have equal concentrations of impurity B) the emitter has the least concentration of impurity C) the collector has the least concentration of impurity D) the base has the least concentration of impurity
In the fabrication of a p-type semiconductor, elemental boron is diffused a small distance into a solid crystalline silicon wafer. The boron concentration within the solid silicon determines semiconducting properties of the material. A physical vapor deposition process keeps the concentration of elemental boron at the surface of the wafer equal to 5.0 x 1020 atoms boron/cm3 silicon. In the manufacture of a transistor, it is desired to produce a thin film of silicon doped to a boron concentration of at least 1.7 x 1019 atoms boron/cm3 silicon at a depth of 0.20 microns (µm) from the surface of the silicon wafer. It is desired to achieve this target within a 30-min processing time. The density of solid silicon can be stated as 5.0 x 1022 atoms Si/ cm3 solid. (a) At what temperature must the boron-doping process be operated? It is known that the temperature dependence of the diffusion coefficient of boron (A) in silicon (B) is given by Where Do=0.019 cm2/s and Qo=2.74 x 105…
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Physics for Scientists and Engineers with Modern Physics, Technology Update

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